[Paper using probabilistic CAs to model epitaxial film growth] - A New Kind of Science: The NKS Forum

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Paper using probabilistic CAs to model epitaxial film growth

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Posted by: Richard Phillips

Here is a recent paper that makes reference to NKS:

Kosturek, R. and K. Malarz.
New Cellular Automaton Designed To Simulate Epitaxial Films Growth

http://arxiv.org/PS_cache/cond-mat/pdf/0406/0406677.pdf

Abstract: In this paper a simple (2+1) solid-on-solid model of the
epitaxial films growth based on random deposition followed by breaking
particle-particle lateral bonds and particles surface diffusion is
introduced. The influence of the critical number of the
particle-particle lateral bonds z and the deposition rate on the surface
roughness dynamics and possible surface morphology anisotropy is
presented. The roughness exponent and the growth exponent are (0.863,
0.357), (0.215, 0.123), (0.101, 0.0405) and (0.0718, 0.0228) for z = 1,
2, 3 and 4, respectively. Snapshots from simulations of the growth
process are included.

Some comments:

They describe a probabilistic CA to model thin film deposition processes ("thin film epitaxial growth"), where a more or less rough surface develops as material is added.

Of course it's tempting to suggest a model could be created using a deterministic rule too, but I'm no expert in this area. They comment on the qualitative results the model produces, which is rather an NKS way to look at things.

It reminds me slightly of discussion of generalized aggregation models in the book - see p.979




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